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Know the whole process equipment of high density products made by Austria | QFN! Create a precision semiconductor process to help upgrade production!
Release time:
2024-08-03 17:30
Development (Develop): It is a photolithography technology in which the photoresist in the exposed area of the positive photoresist and the non-exposed area of the negative photoresist is dissolved in the developer to form a three-dimensional pattern on the photoresist. The photoresist pattern left after the development will be used as a mask in the subsequent etching and ion implantation processes, and therefore, the development is an important process.
Etching (etching): A technique that uses a chemical reaction or physical impact to remove part of the material. It can be used to manufacture printed concave-convex plates such as copperplate and zinc plate at the earliest, and is also widely used in the processing of weight-reducing instrument panels, nameplates and thin workpieces that are difficult to process by traditional processing methods. After continuous improvement and development of process equipment, it can also be used for the processing of precision etching products for electronic sheet parts in aviation, machinery and chemical industries, especially in semiconductor manufacturing, etching is an indispensable technology.
Developing and etching equipment
Overall layout
This developing etching equipment is 45000mm long, 3600mm wide and 2600mm high. The specific equipment size can be designed according to the specific requirements of customers. The maximum width of the acceptable product material is 380mm, and the thickness is between 0.08mm and 0.8mm. The spray pressure is appropriately adjusted according to the thickness of the material, leaving more than 5~10mm copper edge.
Process flow
The copper material is cleaned, laminated and exposed, and the IC frame pattern to be etched is developed according to the pattern designed by the exposure film plate, then etched according to the developed pattern, and finally the film is removed, and the whole etching process is completed.
The specific process flow of the development and etching equipment of Allmerit Technology is as follows:
Equipment Features
Each piece of Allmerit's equipment embodies ingenious R & D design and exquisite manufacturing technology. The birth of each component is the result of countless times of careful carving, repeated revision and optimization. We are committed to eradicating potential defects from the source, and constantly promote the performance of the equipment leap and comprehensive upgrade, to ensure that each product can exceed expectations and become the industry leader.
This integrated circuit lead frame development etching equipment has been upgraded and optimized in the following aspects:
The discharge reel automatically expands, and the shaft core extension motor automatically adjusts, which greatly reduces the operating intensity of the FFU filter system and avoids material contamination.
Level 3 water washing, and increase the sandblasting process, strengthen the cleaning effect.
The demoulding cylinder is designed to be divided into two independent cylinders to prevent the membrane slag from polluting the single lower cylinder block and adding a filter screen to prevent the membrane slag from being sprayed onto the product by Pump.
Tail CCD hole size detection alarm, automatically adjust the operating speed of the equipment to make up for the size deviation.
The whole line adopts filter bag filter, with high filtration efficiency, small pressure loss and more convenient replacement operation.
Visual high-level overflow design to facilitate timely observation of liquid level conditions.
The key tank body is all high-performance CPVC materials, the equipment has high reliability, and the material deformation is completely avoided.
D160mm large diameter reflux, reflux speed, to prevent liquid overflow.
Both the inner and outer glass are added with handles, which makes the operation easier and increases the sealing plate to prevent water string.
All the careful research and development and design, only to show the best etching effect, high precision, high uniformity, Allmerit extreme to meet the production needs of customers.
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